Isothermal section of the Cu-Mn-Si ternary system at 700 °C

Journal of Alloys and Compounds

Volumn 492, Issue 1-2, 2010, Pages 190-195

  Liu, Shuhong ^a   Du, Yong ^a   Zhang, Chao ^b   Xu, Honghui ^a   Huang, Baiyun ^a   Liang, Jianlie ^a,c   Zhou, Yichun ^d   Zheng, Feng ^a   Li, Yiwei ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

^b SISSA   (Italy)

^c GUANGXI UNIVERSITY FOR NATIONALITIES   (China)

^d XIANGTAN UNIVERSITY   (China)

Author keywords

Cu Mn Si system; Phase diagram; Scanning electron microscopy, SEM; X ray diffraction

Indexed keywords

APPROXIMATE FORMULAS; AVERAGE COMPOSITION; BINARY COMPOUNDS; CONCENTRATION RANGES; ISOTHERMAL SECTIONS; LATTICE PARAMETERS; SCANNING ELECTRON MICROSCOPY , SEM; T-PHASE; TERNARY COMPOUNDS; THREE-PHASE EQUILIBRIA;

DIFFRACTION; ELECTRON PROBE MICROANALYSIS; ELECTRONS; ISOTHERMS; MANGANESE COMPOUNDS; PHASE DIAGRAMS; PHASE EQUILIBRIA; SCANNING; SCANNING ELECTRON MICROSCOPY; SILICON; SOLUBILITY; TERNARY ALLOYS; TERNARY SYSTEMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

MANGANESE;

EID: 76549095427     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.11.176     Document Type: Article

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