Thin MoO3 films for sensor applications

Journal of Optoelectronics and Advanced Materials

Volumn 11, Issue 10, 2009, Pages 1363-1366

  Georgieva, V ^a   Stefanov, P ^b   Spassov, L ^a   Raicheva, Z ^a   Atanassov, M ^a   Tincheva, T ^b   Manolov, E ^a   Vergov, L ^a  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY   (Bulgaria)

Author keywords

MoO3 thin films; NH3 gas adsorption; QCM sensor

Indexed keywords

AMMONIA; DEPOSITION RATES; FILM PREPARATION; GAS ADSORPTION; MOLYBDENUM OXIDE; PHOTOELECTRON SPECTROSCOPY; QUARTZ CRYSTAL MICROBALANCES; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SURFACE ANALYSIS; THIN FILMS;

CHARACTERIZATION OF THE FILMS; ELLIPSOMETRIC MEASUREMENTS; FREQUENCY CHANGES; QCM SENSORS; R.F. MAGNETRON SPUTTERING; SENSOR APPLICATIONS; SORPTION PROPERTIES; X RAY PHOTOEMISSION SPECTROSCOPY;

CHROMIUM COMPOUNDS;

EID: 75949125111     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (5)

1. O. M. Hussain, K. S. Rao, Mater. Chem. Phys. 80, 638 (2003).
2. Z. Hussain, J. Electr. Mater. 31, 615 (2002).
3. C. G. Granqvist, Hand Book of Inorganic Electrochromic Materials, Elsevier, Berlin, 1995.
4. R. Tokarz-Sobieraj, K. Hermann, M. Witko, A. Blume, G. Mestl, R. Schlögl, Surf. Sci. 489, 107 (2001).
5. G. Z. Sauerbrey, J. Physik 155, 206 (1959).