Surface texturization and interface passivation of mono-crystalline silicon substrates by wet chemical treatments

Solid State Phenomena

Volumn 145-146, Issue , 2009, Pages 223-226

  Sievert, W ^a   Zimmermann, K U ^b   Hartmann, B ^b   Klimm, C ^c   Jacob, K ^c   Angermann, H ^c  

^a Sievert Consulting   (Germany)

^b HONEYWELL   (United States)

^c HAHN MEITNER INSTITUT   (Germany)

Author keywords

H termination; Light trapping; Scanning electron microscopy SEM; Si surface texturization; Surface photo voltage SPV; UV NIR reflectance; Wet chemical etching

Indexed keywords

EID: 75949123496     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.145-146.223     Document Type: Conference Paper

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