Electrodeposited hydroxyapatite thin films modified by ion beam irradiation

Journal of Optoelectronics and Advanced Materials

Volumn 11, Issue 11, 2009, Pages 1848-1854

  Djosic M S ^a   Bibic N ^b   Mitric M N ^b   Siljegovic M ^b   Stojanovic J N ^a   Jokic B ^c   Janackovic Dj T ^c   Miskovic Stankovic, V B ^c  

^a INSTITUTE FOR TECHNOLOGY OF NUCLEAR AND OTHER MINERAL RAW MATERIALS   (Serbia)

^b UNIVERSITY OF BELGRADE   (Serbia)

^c UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

Films; Hydroxyapatite; Ion implantation; Surfaces

Indexed keywords

ARGON; ELECTRODEPOSITION; ELECTRODES; ELECTRON ENERGY LEVELS; ENERGY DISSIPATION; FILMS; HYDROXYAPATITE; ION BEAMS; ION IMPLANTATION; NITROGEN; SURFACES; THIN FILMS;

ARGON ION IRRADIATION; DIFFERENT MECHANISMS; ELECTRON ENERGY LOSS; HYDROXYAPATITE THIN FILMS; ION BEAM IRRADIATION; IONS IRRADIATION; NITROGEN ION IRRADIATION; UNIT CELL PARAMETERS;

ION BOMBARDMENT;

EID: 75949108909     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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