Particle - Wafer interactions in semiaqueous silicon cleaning systems

Solid State Phenomena

Volumn 145-146, Issue , 2009, Pages 77-84

  Hupka, Lukasz ^a   Nalaskowski, Jakub ^a   Sinha, Nishant ^b   Greeley, Joseph N ^b   Clark, Zak ^b   Du, Hao ^a   Johnson, William P ^a   Miller, Jan D ^a  

^a UNIVERSITY OF UTAH   (United States)

^b MICRON TECHNOLOGY INC   (United States)

Author keywords

AFM; Colloidal probe; Hydrophobic forces; Interaction forces; Lateral force; Molecular dynamics simulations; Post CMP cleaning; Semiaqueous cleaning; Silicon cleaning

Indexed keywords

ATOMIC FORCE MICROSCOPY; CLEANING; ELECTRIC PROPERTIES; HYDROPHOBICITY; MOLECULAR DYNAMICS; NANOTECHNOLOGY; PROBES; SEMICONDUCTING SILICON COMPOUNDS; SILICA; VAN DER WAALS FORCES; HYDROPHILICITY; SOLS;

AFM; COLLOIDAL PROBE; COLLOIDAL PROBES; HYDROPHOBIC FORCES; INTERACTION FORCES; LATERAL FORCE; MOLECULAR DYNAMICS SIMULATIONS; POST-CMP CLEANING;

SILICON WAFERS;

EID: 75849140477     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.145-146.77     Document Type: Conference Paper

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