Influences of underlayers on structure of TiO2 thin films prepared by radio frequency magnetron sputtering

Journal of the Ceramic Society of Japan

Volumn 118, Issue 1373, 2010, Pages 5-8

  Kamiko, Masao ^a   Ha, Jae Geun ^b   Aotani, Kazuaki ^a   Yamamoto, Ryoichi ^a  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^b Kwangwoon University   (South Korea)

Author keywords

Crystal growth; Epitaxy; Sputtering; Surfactant; Thin film

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER; CRYSTAL GROWTH; EPITAXIAL GROWTH; FILM GROWTH; MAGNETRON SPUTTERING; OXIDE MINERALS; SPUTTERING; SURFACE ACTIVE AGENTS; SURFACE ROUGHNESS; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTAL QUALITIES; FILM STRUCTURE; POLYCRYSTALLINE STRUCTURE; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; RUTILE AND ANATASE; SURFACTANT EFFECTS; THIN STRUCTURE;

SILVER;

EID: 75749157733     PISSN: 18820743     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj2.118.5     Document Type: Article

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