Capillary negative pressure measured by nanochannel collapse

Langmuir

Volumn 26, Issue 3, 2010, Pages 1473-1476

  Tas, Niels R ^a   Escalante, Maryana ^a   Van Honschoten, Joost W ^a   Jansen, Henri V ^a   Elwenspoek, M ^a,b  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b UNIVERSITY OF FREIBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHANNEL WIDTHS; FLEXIBLE PLATES; NANO CHANNELS; NEGATIVE PRESSURES; SILICA NANOCHANNELS; YOUNG LAPLACE EQUATION;

ACETONE; ETHANOL; SILICA; SURFACE TENSION;

LAPLACE EQUATION;

EID: 75749145513     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la903649n     Document Type: Article

References (23)

1. Huygens, C. Philos. Trans. 1672, 7, 5027.
2. Newton, I. Optics, 3rd ed.; London, 1721.
3. Lord Kelvin, Proc. R. Soc. Edinburgh 1870, 7, 63.
4. Wiig, E. O.; Juhola, A. J. J. Am. Chem. Soc. 1949, 71, 561.
5. Mercury, L.; Tardy, Y. C. R. Acad. Sci., Ser. IIa: Sci. Terre Planetes 1997, 325, 947.
6. Fisher, L. R.; Israelachvili, J. N. Chem. Phys. Lett. 1980, 76, 325.
7. Yang, S. H.; Nosonovski, M.; Zhang, H.; Chung, K.-H. Chem. Phys. Lett. 2008, 451, 88.
8. Tas, N. R.; Mela, P.; Kramer, T.; Berenschot, J. W.; van den. Berg, A. Nano Lett. 2003, 3, 1537.
9. van Honschoten, J. W.; Escalante, M.; Tas, N. R.; Jansen, H. V.; Elwenspoek, M. J. Appl. Phys. 2007, 101, 094310.
10. Fisher, J. C. J. Appl. Phys. 1948, 19, 1062.
11. van Honschoten, J. W.; Escalante, M.; Tas, N. R.; Elwenspoek, M. J. Colloid Interface Sci. 2009, 329, 133. Figure 3b is reprinted with permission from Elsevier (copyright 2009).
12. Timoshenko, S. P.; Woinowsky-Krieger, S. Theory of Plates and Shells; McGraw-Hill: New York, 1.959; Chapter 1.
13. The tensile stress in the silicon nitride is high; therefore, stiffening of the membrane due to deflection-induced stretching can be neglected.
14. Tas, N.; Wissink, J. W.; Sander, L.; Lammerink, T.; Elwenspoek, M. Sens. Actuators, A 1998, 70, 171.
15. Bouwstra, S. Resonating Microbridge Mass Flow Sensor. Ph.D. Thesis, University of Twente, 1990; Chapter 3.
16. Measured by the wafer curvature method after annealing.
17. CRC Handbook of Chemistry and Physics, 67th ed.; Weast, R. C., Ed.; CRC Press: Boca Raton, FL, 1986; pp F32 - F33.
18. Water: static contact angle of θ = 40 ± 8° on silicon nitride and θ = 42 ± 5° on silicon oxide. Aniline: static contact angle of 22 ± 9° on silicon nitride and 28 ± 5° on silicon oxide.
19. Mastrangelo, C. H.; Hsu, C. H. J. MEMS 1993, 2, 33.
20. Mastrangelo, C. H.; Hsu, C. H. J. MEMS 1993, 2, 44
21. Tas, N.; Sonnenberg, T.; Jansen, H. V.; Legtenberg, R.; Elwenspoek, M. J. Micromech. Microeng. 1996, 6, 385.
22. Legtenberg, R.; Tilmans, H. A. C.; Elders, J.; Elwenspoek, M. Sens. Actuators, A 1994, 43, 230.
23. DelRio, F. W.; Dunn, M. L.; Phinney, L. M.; Bourdon, C. J.; de Boer, M. P. Appl. Phys. Lett. 2007, 90, 163104.