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Volumn 26, Issue 3, 2010, Pages 1539-1543

Selective nanofiber deposition using a microfluidic confinement approach

Author keywords

[No Author keywords available]

Indexed keywords

CAPILLARY FILLING; CELL BIOLOGY; ETCHING SOLUTIONS; EXTRACELLULAR MATRICES; HIGH DEFINITION; MICROPATTERNS; NANOFIBER MATS; SELECTIVE DEPOSITION; VERSATILE METHODS;

EID: 75749100663     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la903988w     Document Type: Article
Times cited : (24)

References (31)
  • 29
    • 75749152447 scopus 로고    scopus 로고
    • note
    • 2 is used to expose the photoresist through a photomask for 30 s. Subsequently, the slide is soaked in MIF-300 developer for 90 s to thoroughly remove unwanted photoresist. The postbake treatment is conducted in an oven at 120 °C for 30 min to stabilize the photoresist. Finally, a wet etching method is used to etch the unwanted gold and titanium, which involves (i) soaking the slide in a 1% (w/w) hydrofluoric acid solution for 4 min, (ii) soaking the slide in a gold etchant GE8148 solution (Transene Inc., MA) for 1 min, and (iii) thoroughly washing away the remaining photoresist using acetone and methanol sequentially and drying in air.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.