Atmospheric large sized remote plasma source for surface treatment

IEEJ Transactions on Fundamentals and Materials

Volumn 129, Issue 12, 2009, Pages 903-908

  Sasaki, Ryota ^a   Kumagai, Wataru ^a   Miyahara, Hidekazu ^a   Shimada, Ryuichi ^a   Hotta, Eiki ^a   Okino, Akitoshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Atmospheric plasma; Hydrophilization; Plasma process; Remote plasma; Surface treatment

Indexed keywords

ATMOSPHERIC PLASMA SOURCES; ATMOSPHERIC PLASMAS; ATMOSPHERIC PRESSURE PLASMAS; CONCENTRATION OF; HIGH PURITY; HYDROPHILIC EFFECT; HYDROPHILIZATION; LOW COSTS; LOW PRESSURE PLASMA; PLASMA IRRADIATIONS; PLASMA PROCESS; PUMPING SYSTEMS; REMOTE PLASMA SOURCES; REMOTE PLASMAS; VACUUM CHAMBERS;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; GLASS; INDUSTRIAL APPLICATIONS; PLASMA SOURCES; SURFACE TENSION; VACUUM APPLICATIONS;

SURFACE TREATMENT;

EID: 75649120727     PISSN: 03854205     EISSN: 13475533     Source Type: Journal    
DOI: 10.1541/ieejfms.129.903     Document Type: Article

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