Microstructure of MmM5/Mg multi-layer hydrogen storage films prepared by magnetron sputtering

Microscopy Research and Technique

Volumn 64, Issue 4, 2004, Pages 323-329

  Ouyang, L Z ^a   Wang, H ^a   Zhu, M ^a   Zou, J ^b   Chung, C Y ^c  

^a SOUTH CHINA UNIVERSITY OF TECHNOLOGY   (China)

^b UNIVERSITY OF QUEENSLAND   (Australia)

^c CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Hydrogen storage alloys; Magnetron sputtering; Thin films; Transmission electron microscopy

Indexed keywords

CRYSTALLITES; FILM PREPARATION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HYDROGEN STORAGE; HYDROGEN STORAGE ALLOYS; MICROSTRUCTURE; NANOCRYSTALS; THIN FILMS;

AMORPHOUS REGIONS; DEPOSITION CONDITIONS; DIRECT CURRENT MAGNETRON SPUTTERING; DIRECT-CURRENT MAGNETRON SPUTTERING; GROWTH DIRECTIONS; MAGNETRON-SPUTTERING; MISCH METAL; MULTI-LAYERS; NANOCRYSTALLINES; THIN-FILMS;

MAGNETRON SPUTTERING;

ALLOY; ALUMINUM DERIVATIVE; COBALT COMPLEX; MAGNESIUM; MANGANESE DERIVATIVE; NICKEL COMPLEX;

ARTICLE; CRYSTAL; ELECTRON MICROSCOPY; FILM; MICROWAVE OVEN; MORPHOLOGY; PRIORITY JOURNAL; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY SPECTROMETRY;

EID: 7544232168     PISSN: 1059910X     EISSN: None     Source Type: Journal    
DOI: 10.1002/jemt.20089     Document Type: Article

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