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Volumn 27, Issue 11, 2004, Pages 46-52
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Metrology develops to measure thinner films better
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRON BEAMS;
ELLIPSOMETRY;
FLUORESCENCE;
NANOTECHNOLOGY;
PHOTOACOUSTIC EFFECT;
POLARIZATION;
SILICON COMPOUNDS;
SPECTROMETRY;
STATISTICAL PROCESS CONTROL;
THICKNESS MEASUREMENT;
ULTRAVIOLET RADIATION;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
BEAM BROFILE REFLECTOMETRY (BPR);
E-BEAM STIMULATED DISPERSIVE X-RAY (ESX) SPECTROMETRY;
EQUIVALENT OXIDE THICKNESS (EOT);
SPECTROSCOPIC ELLIPSOMETRY (SE);
THIN FILMS;
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EID: 7544231744
PISSN: 01633767
EISSN: None
Source Type: Journal
DOI: None Document Type: Review |
Times cited : (3)
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References (0)
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