Molten metal flux growth and properties of CrSi2

Journal of Alloys and Compounds

Volumn 383, Issue 1-2, 2004, Pages 319-321

  Shishido, T ^a   Okada, S ^b   Ishizawa, Y ^c   Kudou, K ^d   Iizumi, K ^e   Sawada, Y ^e   Horiuchi, H ^f   Inaba, K ^g   Sekiguchi, T ^h   Ye, J ^h   Miyashita, S ⁱ   Nomura, A ⁱ   Sugawara, T ⁱ   Obara, K ⁱ   Oku, M ⁱ   Fujiwara, K ⁱ   Ujihara, T ⁱ   Sazaki, G ⁱ   Usami, N ⁱ   Kohiki, S ^j   Kawazoe, Y ^j   Nakajima, K ^j   more..

^a TOHOKU UNIVERSITY   (Japan)

^b KOKUSHIKAN UNIVERSITY   (Japan)

^c IWAKI MEISEI UNIVERSITY   (Japan)

^d KANAGAWA UNIVERSITY   (Japan)

^e TOKYO POLYTECHNIC UNIVERSITY   (Japan)

^f HIROSAKI UNIVERSITY   (Japan)

^g RIGAKU CORPORATION   (Japan)

^h NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

ⁱ UNIVERSITY OF TOYAMA   (Japan)

^j KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

more..

Author keywords

Chromium disilicide; Crystal growth; Electrical resistivity; Flux method; Micro Vickers hardness; Oxidation resistivity

Indexed keywords

ALUMINA; CRYSTAL GROWTH; CRYSTAL STRUCTURE; ELECTRIC FURNACES; ELECTRIC RESISTANCE; IMPURITIES; LATTICE CONSTANTS; LIQUID METALS; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; THERMODYNAMIC STABILITY; THERMOELECTRICITY; VICKERS HARDNESS TESTING;

CHROMIUM DISILICIDE; FLUX GROWTH; FLUX METHOD; MOLTEN TIN;

CHROMIUM COMPOUNDS;

EID: 7544230812     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2004.04.037     Document Type: Conference Paper

References (5)

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4. Mattheis L.F. Phys. Rev. B: Condens. Matter. 45:1992;3252.
5. Shishido T., Ye J., Okada S., Kudou K., Oku M., Obara K., et al. Jpn. J. Appl. Phys. 41:2002;3031.