Gas-phase kinetics of chlorosilylene reactions II. ClSiH + C2H4: Absolute rate measurements and quantum chemical and RRKM calculations for the prototype π addition reaction

ChemPhysChem

Volumn 11, Issue 2, 2010, Pages 419-428

  Becerra, Rosa ^b   Boganov, Sergey E ^c   Egorov, Mikhail P ^c   Krylova, Irina V ^c   Nefedov, Oleg M ^c   Promyslov, Vladimir M ^c   Walsh, Robin ^a  

^a UNIVERSITY OF READING   (United Kingdom)

^b INSTITUTO DE QUÍMICA FÍSICA ROCASOLANO   (Spain)

^c N D ZELINSKY INSTITUTE OF ORGANIC CHEMISTRY   (Russian Federation)

Author keywords

Addition mechanism; Chlorosilylene; Gas phase kinetics; Quantum chemical calculations; RRKM calculations

Indexed keywords

ADDITION REACTIONS; ETHYLENE; GASES; PHOTOLYSIS; POTENTIAL ENERGY; QUANTUM CHEMISTRY; RATE CONSTANTS; SURFACE REACTIONS; THERMAL LOGGING;

BIMOLECULAR REACTION; CHLOROSILYLENE; GAS PHASE KINETICS; HIGH-PRESSURE LIMITS; QUANTUM CHEMICAL CALCULATIONS; RRKM CALCULATIONS; SECOND-ORDER RATE CONSTANTS; TIME RESOLVED STUDIES;

SILICON COMPOUNDS;

EID: 75249084973     PISSN: 14394235     EISSN: 14397641     Source Type: Journal    
DOI: 10.1002/cphc.200900490     Document Type: Article

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