Well-aligned ZnO nanowire arrays prepared by seed-layer-free electrodeposition and their cassie-wenzel transition after hydrophobization

Journal of Physical Chemistry C

Volumn 114, Issue 1, 2010, Pages 194-202

  Pauporte Th ^a   Bataille, G ^a   Joulaud, L ^b   Vermersch, F J ^b  

^a PSL RESEARCH UNIVERSITY   (France)

^b SAINT GOBAIN RECHERCHE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AS-GROWN; BIOLOGICAL EXPERIMENTS; DEPOSITION TIME; ELECTROCHEMICAL ROUTES; FLUORINE DOPED TIN OXIDE; HYDROPHOBIZATIONS; LAYER MORPHOLOGY; PRECURSOR CONCENTRATION; RECEDING CONTACT; SEED LAYER; SELF-ALIGNMENT PROCESS; SELF-CLEANING SURFACES; SUBSTRATE ETCHING; SUPER-HYDROPHILIC; SUPERHYDROPHOBIC; SURFACE DERIVATIZATION; WELL-ALIGNED; WENZEL STATE; ZNO NANOWIRE ARRAYS; ZNO NANOWIRES; ZNO NWS;

ACETONE; CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; CONTROL SURFACES; FLUORINE; HYDROPHOBICITY; NANOWIRES; PRESSURE DROP; STEARIC ACID; TIN; TITANIUM COMPOUNDS; WIRE; ZINC OXIDE;

ASPECT RATIO;

EID: 75149146703     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp9087145     Document Type: Article

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