Development of fuel-model interfaces: Characterization of Pd containing UO2 thin films

Journal of Nuclear Materials

Volumn 397, Issue 1-3, 2010, Pages 19-26

  Stumpf, S ^a   Seibert, A ^a   Gouder, T ^a   Huber, F ^a   Wiss, T ^a   Romer J ^b   Denecke, M A ^b  

^a JOINT RESEARCH CENTRE   (Italy)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CODEPOSITION; FILM MATRIX; HEATING TEMPERATURES; HIGH TEMPERATURE; HOMOGENEOUS DISTRIBUTION; MATRIX; METALLIC PARTICLES; MODEL INTERFACE; MODERATE TEMPERATURE; NOBLE METALS; PD THIN FILMS; REDOX CONDITION; SI WAFER; SPENT NUCLEAR FUELS;

AGGLOMERATION; HEATING; PRECIOUS METALS; RADIOACTIVE WASTES; REDOX REACTIONS; SEMICONDUCTING SILICON COMPOUNDS; SILICON ALLOYS; SILICON WAFERS; SURFACE REACTIONS; THIN FILMS;

PALLADIUM;

EID: 75149117342     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnucmat.2009.11.025     Document Type: Article

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