Study of nanocrystallization in FINEMET alloy by active screen plasma nitriding

Journal of Alloys and Compounds

Volumn 491, Issue 1-2, 2010, Pages 487-494

  Shivaee, Hossein Asghari ^a   Hosseini, Hamid Reza Madaah ^a   Lotfabad, Elmira Memarzadeh ^a   Roostaie, Saied ^b  

^a SHARIF UNIVERSITY OF TECHNOLOGY   (Iran)

^b AMIRKABIR UNIVERSITY OF TECHNOLOGY   (Iran)

Author keywords

Active screen plasma nitriding; FINEMET alloy; Nanocrystallization

Indexed keywords

ACTIVE SCREEN PLASMA NITRIDING; AMORPHOUS RIBBON; COERCIVITIES; CRYSTALLINE VOLUME FRACTION; ELECTRICAL AND MAGNETIC PROPERTY; ELECTRICAL RESISTIVITY; FINEMET ALLOY; FINEMET ALLOYS; FINER GRAINS; LATTICE PARAMETERS; MICROHARDNESS MEASUREMENT; NANO-CRYSTALLIZATION PROCESS; SATURATED MAGNETIZATION; SI ATOMS; STRUCTURAL FEATURE; TWO-GAS MIXTURES; VIBRATING SAMPLE MAGNETOMETER;

ATOMIC FORCE MICROSCOPY; CRYSTAL ATOMIC STRUCTURE; DIFFERENTIAL SCANNING CALORIMETRY; ELECTRIC CONDUCTIVITY; ELECTRIC NETWORK ANALYSIS; GAS MIXTURES; IRON ALLOYS; MAGNETIC PROPERTIES; MECHANICAL PROPERTIES; MICROHARDNESS; NANOCRYSTALLIZATION; NITRIDING; PLASMAS; SILICON; SILICON ALLOYS; SURFACE TREATMENT; ULTRAHIGH MOLECULAR WEIGHT POLYETHYLENES; X RAY DIFFRACTION;

PLASMA APPLICATIONS;

EID: 75049085408     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.10.240     Document Type: Article

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