Approaches to influence the microstructure and the properties of Al-Cr-O layers synthesized by cathodic arc evaporation

Surface and Coatings Technology

Volumn 204, Issue 11, 2010, Pages 1722-1728

  de Abreu Vieira, Leandro ^a   Döbeli, Max ^b   Dommann, Alex ^a   Kalchbrenner, Eva ^c   Neels, Antonia ^a   Ramm, Jürgen ^c   Rudigier, Helmut ^c   Thomas, Jürgen ^d   Widrig, Beno ^c  

^a CSEM   (Switzerland)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

^c Balzers AG   (Liechtenstein)

^d IFW DRESDEN   (Germany)

Author keywords

Arc evaporation; Ion current; Multi layer; Pulsed arc discharge; Ternary oxide

Indexed keywords

ARC DISCHARGE; ARC EVAPORATION; CATHODIC ARC EVAPORATION; ION CURRENTS; ION SPLITTING; LAYER MORPHOLOGY; LOW BIAS VOLTAGE; MULTILAYER STRUCTURES; NUCLEATION BEHAVIOR; OXYGEN FLOW; OXYGEN GAS FLOW; PROPERTIES OF AL; PULSED ARC DISCHARGE; PULSED MODE; PULSED OPERATION; REACTIVE GAS; SINGLE COMPOSITES; TERNARY OXIDES;

ALUMINUM; CHROMIUM; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; EVAPORATION; IONIZATION OF GASES; IONS; MICROSTRUCTURE; MORPHOLOGY; OXYGEN; VAPORS; WELDS;

CAVITY RESONATORS;

EID: 74849122840     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.10.055     Document Type: Article

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