Plasma- and vacuum-ultraviolet (VUV) photo-polymerisation of N- and O-rich thin films

Radiation Physics and Chemistry

Volumn 79, Issue 3, 2010, Pages 310-314

  Ruiz, Juan Carlos ^a   Girard Lauriault, Pierre Luc ^a   Truica Marasescu, Florina ^a   Wertheimer, Michael R ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

Ethylene; N and O rich films; Photo polymerisation; Plasma polymerisation; VUV photochemistry

Indexed keywords

BINARY GAS MIXTURE; CARBOXYLIC ACID GROUPS; FTIR; GAS FLOW MIXTURES; NITROUS OXIDE; ORGANIC THIN FILMS; PLASMA POLYMERISATION; PLASMA POLYMERS; POLYMERISATION; PRIMARY AMINES; RADIO FREQUENCIES; REACTION MECHANISM; REFLECTION-ABSORPTION; VACUUM ULTRAVIOLETS; X-RAY PHOTOELECTRONS; XPS;

ABSORPTION SPECTROSCOPY; BINARY MIXTURES; CARBOXYLIC ACIDS; ETHYLENE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS ABSORPTION; GLOW DISCHARGES; NITROGEN OXIDES; ORGANIC ACIDS; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PLASMAS; THIN FILMS; VACUUM;

POLYMERIZATION;

AMINE; AMMONIA; CARBOXYLIC ACID DERIVATIVE; ETHYLENE; NITROGEN; NITROUS OXIDE; OXYGEN; POLYMER;

ARTICLE; CHEMICAL REACTION; CHEMICAL STRUCTURE; CONTROLLED STUDY; FILM; GAS FLOW; INFRARED SPECTROSCOPY; PHOTOCHEMISTRY; PHOTOLYSIS; PLASMA; POLYMERIZATION; RADIOFREQUENCY; ULTRAVIOLET RADIATION; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 74749102786     PISSN: 0969806X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.radphyschem.2009.08.009     Document Type: Article

References (14)

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