Synthesis and characterization of nickel selenide thin films deposited by chemical method

Journal of Alloys and Compounds

Volumn 490, Issue 1-2, 2010, Pages 228-231

  Hankare, P P ^a   Jadhav, B V ^a   Garadkar, K M ^a   Chate, P A ^b   Mulla, I S ^c   Delekar, S D ^d  

^a SHIVAJI UNIVERSITY   (India)

^b JSM College   (India)

^c NATIONAL CHEMICAL LABORATORY   (India)

^d DR BABASAHEB AMBEDKAR MARATHWADA UNIVERSITY   (India)

Author keywords

Crystal growth; Semiconductors; Thin films; X ray diffraction

Indexed keywords

ALKALINE MEDIUM; CHEMICAL BATH; CHEMICAL METHOD; CONDUCTING GLASS; ELECTRICAL MEASUREMENT; ELECTRICAL RESISTIVITY; HEXAGONAL SYSTEMS; HYDRAZINE HYDRATE; NICKEL SELENIDE THIN FILMS; NICKEL SULPHATE; OPTICAL ABSORPTION; P-TYPE CONDUCTION; POLYCRYSTALLINE; SEMICONDUCTORS THIN FILMS; SODIUM SELENOSULPHATE; SYNTHESIS AND CHARACTERIZATION;

COLOR FILMS; CRYSTAL GROWTH; CRYSTALLIZATION; DIFFRACTION; ELECTRIC CONDUCTIVITY; GRAIN BOUNDARIES; HYDRATES; NICKEL; NICKEL ALLOYS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR GROWTH; SODIUM; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

CONDUCTIVE FILMS;

EID: 74249086510     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.09.132     Document Type: Article

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