Large area high efficiency broad bandwidth 800 nm dielectric gratings for high energy laser pulse compression

Optics Express

Volumn 17, Issue 26, 2009, Pages 23809-23816

  Martz, D H ^a   Nguyen, H T ^b   Patel, D ^a   Britten, J A ^b   Alessi, D ^a   Krous, E ^a   Wang, Y ^a   Larotonda, M A ^a   George, J ^c   Knollenberg, B ^c   Luther, B M ^a   Rocca, J J ^a   Menoni, C S ^a  

^a Veterinary Dentistry and Oral Surgery   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^c Veeco Process Equipment Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH COMPRESSION; HIGH ENERGY LASERS; HIGH ENERGY PHYSICS; LASER PULSES; MULTILAYERS; SILICON COMPOUNDS; SPUTTERING; TANTALUM;

AT-WAVELENGTH; BROAD BANDWIDTHS; CENTER WAVELENGTH; DIELECTRIC GRATING; HIGH AVERAGE POWER; HIGH EFFICIENCY; HIGH ENERGY; ION-BEAM SPUTTERING; MULTI-LAYER-COATING; MULTILAYER DIELECTRIC DIFFRACTION GRATINGS; TI: SAPPHIRE LASER;

PULSED LASER APPLICATIONS;

ARTICLE; COMPUTER AIDED DESIGN; EQUIPMENT; EQUIPMENT DESIGN; ILLUMINATION; INSTRUMENTATION; LASER; REFRACTOMETRY;

COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LASERS; LIGHTING; REFRACTOMETRY;

EID: 73949133532     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.023809     Document Type: Article

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