Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films

Journal of Applied Polymer Science

Volumn 115, Issue 3, 2010, Pages 1283-1288

  Neumann, Miguel G ^a   Schmitt, Carla C ^a   Goi, Beatriz E ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

Poly(alkyl methacrylate) films; Polymer photodegradation; Sensitized photodegradation

Indexed keywords

ESTER GROUPS; GLASS TRANSITION TEMPERATURE; PHOTODEGRADATION RATE; POLY(ALKYL METHACRYLATE) FILMS; SENSITIZED PHOTODEGRADATION; SIDE-CHAIN; THIOXANTHONES; TRIPLET STATE; UV-VIS LIGHT;

ALKYLATION; ESTERIFICATION; ESTERS; GLASS TRANSITION; OXYGEN; PHOTOOXIDATION;

POLYMER FILMS;

DEGRADATION; DIFFUSION; FILM; GLASS TRANSITION TEMPERATURE; OXIDATION; POLYMER; POLYMER BLEND; TEMPERATURE EFFECT; ULTRAVIOLET RADIATION;

EID: 73849102862     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.30758     Document Type: Article

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