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Volumn 48, Issue 11, 2009, Pages
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Growth and characterization of highly tensile-strained Ge on In xGa1-xAs virtual substrate by solid source molecular beam epitaxy
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Author keywords
[No Author keywords available]
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Indexed keywords
BUFFER METHOD;
GE FILMS;
IN-MOLE-FRACTION;
MULTI JUNCTION SOLAR CELLS;
PROMISING MATERIALS;
SI-BASED OPTOELECTRONICS;
SOLID SOURCE MOLECULAR BEAM EPITAXY;
STRAIN-RELAXED;
STRAINED-GE;
VIRTUAL SUBSTRATES;
CRYSTAL GROWTH;
FIELD EFFECT TRANSISTORS;
GALLIUM;
GERMANIUM;
INDIUM;
MOLECULAR BEAM EPITAXY;
MOLECULAR BEAMS;
SEMICONDUCTOR QUANTUM WIRES;
SUBSTRATES;
TENSILE STRAIN;
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EID: 73849087714
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.48.111102 Document Type: Article |
Times cited : (19)
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References (20)
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