|
Volumn 101, Issue 8, 2010, Pages 2880-2883
|
Characterization of the thermal-tolerant mutants of Chlorella sp. with high growth rate and application in outdoor photobioreactor cultivation
|
Author keywords
Carbon dioxide; Chlorella sp.; Growth; Microalgae; Thermal tolerant mutant
|
Indexed keywords
CARBON DIOXIDE FIXATION;
CHLORELLA SP;
CULTURE BROTHS;
GROWTH;
HIGH GROWTH RATE;
MICRO-ALGAE;
MUTANT STRAIN;
OUTDOOR CULTIVATION;
PHOTOBIORE-ACTOR;
SPECIFIC GROWTH RATE;
WILD TYPES;
ALGAE;
CARBON DIOXIDE;
MICROORGANISMS;
TELLURIC PROSPECTING;
BIOREACTOR;
CARBON DIOXIDE;
CULTIVATION;
FIXATION;
GREEN ALGA;
GROWTH RATE;
MICROALGA;
MUTATION;
ARTICLE;
CARBON DIOXIDE FIXATION;
CHLORELLA;
CONTROLLED STUDY;
CULTURE TECHNIQUE;
GROWTH RATE;
HEAT TOLERANCE;
MUTANT;
NONHUMAN;
PHOTOBIOREACTOR;
PRIORITY JOURNAL;
STRAIN DIFFERENCE;
TROPICS;
ADAPTATION, BIOLOGICAL;
BIOREACTORS;
CARBON DIOXIDE;
CHLORELLA;
HOT TEMPERATURE;
MUTAGENESIS;
MUTATION;
PHOTOTROPHIC PROCESSES;
TAIWAN;
CHLORELLA SP.;
|
EID: 73749088123
PISSN: 09608524
EISSN: None
Source Type: Journal
DOI: 10.1016/j.biortech.2009.10.007 Document Type: Article |
Times cited : (85)
|
References (11)
|