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Volumn 64, Issue 5, 2010, Pages 559-561
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Role of substrate potential on filling the gap between two planar parallel electrodes in electrophoretic deposition
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Author keywords
Low frequency AC electrophoretic deposition; Nanomaterials; Numerical simulation; Sensors; Titanium dioxide
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Indexed keywords
AC ELECTRIC FIELD;
ELECTROPHORETIC DEPOSITIONS;
GAP FILLING;
GLASS SUBSTRATES;
LOW FREQUENCY;
NANO-MATERIALS;
NONUNIFORM;
NONUNIFORM ELECTRIC FIELD;
NUMERICAL SIMULATION;
PARALLEL ELECTRODES;
PLANAR GOLD ELECTRODES;
SUBSTRATE POTENTIAL;
TIO;
ACETONE;
COMPUTER SIMULATION;
DEPOSITION;
ELECTRIC FIELDS;
ELECTRODES;
ELECTROPHORESIS;
GLASS;
GOLD DEPOSITS;
NANOPARTICLES;
NANOSENSORS;
NANOSTRUCTURED MATERIALS;
OXIDES;
SUBSTRATES;
TITANIUM;
TITANIUM DIOXIDE;
MATHEMATICAL MODELS;
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EID: 73649098236
PISSN: 0167577X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.matlet.2009.11.031 Document Type: Article |
Times cited : (20)
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References (11)
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