Hf3AlN: A novel layered ternary ceramic with excellent damage tolerance

Journal of the American Ceramic Society

Volumn 93, Issue 1, 2010, Pages 228-234

  Li, Fangzhi ^a,b   Liu, Bin ^a,b   Wang, Jingyang ^a   Zhou, Yanchun ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALN; ALN CERAMIC; ELECTRICAL CONDUCTIVITY; FLEXURAL STRENGTH; HIGH-TEMPERATURE STRUCTURAL MATERIALS; IN-SITU; INTERLAYER BONDING; LAYERED CRYSTAL STRUCTURE; METALLIC CONDUCTIVITY; ORTHORHOMBIC STRUCTURES; PHYSICAL AND MECHANICAL PROPERTIES; PRESSING METHODS; REACTION PATHS; SYNTHESIS PROCESS;

BUILDING MATERIALS; CERAMIC MATERIALS; CRYSTAL STRUCTURE; ELASTIC MODULI; ELECTRIC CONDUCTIVITY; FITS AND TOLERANCES; HAFNIUM; MECHANICAL PROPERTIES; SILICON CARBIDE; SYNTHESIS (CHEMICAL);

DAMAGE TOLERANCE;

EID: 73149124718     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2009.03387.x     Document Type: Article

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