Investigation on internal electric field distribution of organic light-emitting diodes (OLEDs) with Eu2O3 buffer layer

Physica Status Solidi (A) Applications and Materials Science

Volumn 206, Issue 11, 2009, Pages 2641-2644

  Shi, Shengwei ^a   Ma, Dongge ^a  

^a CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

8-HYDROXYQUINOLINE; DEVICE PERFORMANCE; ELECTRO-LUMINESCENT; ELECTRON TRANSPORT LAYERS; EUROPIUM OXIDE; FOWLER-NORDHEIM; HOLE INJECTION; HOLE TRANSPORT LAYERS; INDIUM TIN OXIDE; INTERNAL ELECTRIC FIELDS; OPERATIONAL MECHANISM; SCHOTTKY; TURN ON VOLTAGE;

BUFFER LAYERS; ELECTRIC FIELDS; ELECTRIC NETWORK ANALYSIS; ELECTROLUMINESCENCE; ELECTRON INJECTION; ELECTRONIC EQUIPMENT; EUROPIUM; LIGHT EMISSION; LIGHT EMITTING DIODES; ORGANIC LIGHT EMITTING DIODES (OLED); THERMIONIC EMISSION; TIN; TITANIUM COMPOUNDS;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 73049114675     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200925114     Document Type: Article

References (19)

1. C. W. Tang and S. A. VanSlyke, Appl. Phys. Lett. 51, 913 (1987).
2. Y. Luo, H. Aziz, G. Xu, and Z. D. Popovic, J. Appl. Phys. 101, 054512 (2007).
3. J. Huang, G. Li, E. Wu, Q. Xu, and Y. Yang, Adv. Mater. 18, 114 (2006).
4. S. Y. Chen, T. Y. Chu, J. F. Chen, C. Y. Su, and C. H. Chen, Appl. Phys. Lett. 89, 053518 (2006).
5. X. D. Feng, C. J. Huang, V. Lui, R. S. Khangura, and Z. H. Lu, Appl. Phys. Lett. 86, 143511 (2005).
6. S. A. Van Slyke, C. H. Chen, and C.W. Tang, Appl. Phys. Lett. 69, 2160 (1996).
7. S. Y. Kim, J. M. Baik, H. K. Yu, and J. L. Lee, J. Appl. Phys. 98, 093707 (2005).
8. C. A. Di, G. Yu, Y. Q. Liu, X. J. Xu, Y. B. Song, and D. B. Zhu, Appl. Phys. Lett. 89, 033502 (2006).
9. J. Li, M. Yahiro, K. Ishida, H. Yamada, and K. Matsushige, Synth. Met. 151, 141 (2005).
10. C. C. Chang, M. T. Hsieh, J. F. Chen, S. W. Hwang, and C. H. Chen, Appl. Phys. Lett. 89, 253504 (2006).
11. C. W. Tang, S. A. VanSlyke, and C. H. Chen, J. Appl. Phys. 65, 3610 (1989).
12. J. Chen and D. Ma, Chem. Phys. 325, 225 (2006).
13. E. Tutis, D. Berner, and L. Zuppiroli, J. Appl. Phys. 93, 4594 (2003).
14. R. G. Kepler, P. M. Beeson, S. J. Jacobs, R. A. Anderson, M. B. Sinclair, V. S. Valencia, and P. A. Cahill, Appl. Phys. Lett. 66, 3618 (1995).
15. T. Tsutsui, H. Tokuhisa, and M. Era, Proc. SPIE 3281, 230 (1998).
16. W. Riess, H. Riel, T. Beierlein, W. Brütting, P. Müller, and P. F. Seidler, IBM J. Res. Dev. 45, 77 (2001).
17. F. Rohlfing, T. Yamada, and T. Tsutsui, J. Appl. Phys. 86, 4978 (1999).
18. T. Kurobori, T. Yamakage, Y. Hirose, K. Kawamura,1 M. Hirano, and H. Hosono, Jpn. J. Appl. Phys. 44, 910 (2005).
19. C. P. L. Rubinger, L. C. Costa, M. Macatr̃ao, M. Peres, T. Monteiro, F. M. Costa, N. Franco, E. Alves, B. Z. Saggioro, M. R. B. Andreeta, and A. C. Hernandes, Appl. Phys. Lett. 92, 252904 (2008).