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Volumn 25, Issue 1, 2010, Pages 44-47

A three phase rotating field microwave plasma design for a low-flow helium plasma generation

Author keywords

[No Author keywords available]

Indexed keywords

DETECTION LIMITS; ELECTRON NUMBER DENSITIES; EXCITATION TEMPERATURE; FIELD STRENGTHS; FLOW INJECTORS; FUNDAMENTAL PARAMETERS; GAS FLOWS; GHZ FREQUENCIES; HELIUM DISCHARGE; HELIUM PLASMAS; HYDRIDE GENERATIONS; HYDROGEN SEPARATION; INPUT POWER; IONISATION; MICROWAVE FIELD; MICROWAVE PLASMA; ROTATING FIELDS; ROTATIONAL TEMPERATURE; THREE ELECTRODE; THREE PHASE; WATER LOADING;

EID: 72949084361     PISSN: 02679477     EISSN: 13645544     Source Type: Journal    
DOI: 10.1039/b904428k     Document Type: Article
Times cited : (14)

References (12)
  • 6
    • 72949120339 scopus 로고    scopus 로고
    • Patent Pending P-385484
    • Patent Pending P-385484


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.