Direct spectroscopic evidence for a photodoping mechanism in polythiophene and poly(bithiophene-alt-thienothiophene) organic semiconductor thin films involving oxygen and sorbed moisture

Advanced Materials

Volumn 21, Issue 46, 2009, Pages 4747-4752

  Zhuo, Jing Mei ^a   Zhao, Li Hong ^a   Png, Rui Qi ^a   Wong, Loke Yuen ^a   Chia, Perq Jon ^a   Tang, Jie Cong ^a   Sivaramakrishnan, Sankaran ^a   Zhou, Mi ^a   Ou, Eric C W ^b   Chua, Soo Jin ^b   Sim, Wee Sun ^a   Chua, Lay Lay ^a   Ho, Peter K H ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BITHIOPHENES; COUNTERIONS; DISSOLVED WATER; ELECTRICAL CHARACTERISTIC; HIGH MOBILITY; INFRARED SPECTROSCOPIC; KEY FEATURE; ORGANIC SEMICONDUCTOR; ORGANIC SEMICONDUCTOR THIN FILMS; PHOTODOPING; POLY(3-ALKYLTHIOPHENE); POLY-THIOPHENE; REGIO-REGULAR; SPECTROSCOPIC EVIDENCE; THIENOTHIOPHENES;

DISSOLUTION; OXYGEN; SEMICONDUCTOR DOPING; THIOPHENE;

SEMICONDUCTING ORGANIC COMPOUNDS;

EID: 72649087635     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200901120     Document Type: Article

References (43)

1. a) J. S. Kim, P. K. H. Ho, C. E. Murphy, N. Baynes, R. H. Friend, Adv. Mater. 2002, 14, 206.
2. b) J. S. Kim, P. K. H. Ho, C. E. Murphy, A. J. A. B. Seeley, I. Grizzi, J. H. Burroughes, R. H. Friend, Chem. Phy. Lett. 2004, 386, 2.
3. J. Ficker, H. von Seggern, H. Rost, W. Fix, W. Clemens, I. McCulloch, Appl. Phys. Lett. 2004, 85, 1377.
4. C. Tanase, E. J. Meijer, P. W. M. Blom, D. M. De Leeuw, Phys. Rev. Lett. 2003, 97, 216601-1-4.
5. a) G. Horowitz, X. Peng, D. Fichou, F. Garnier, J. Appl. Phys. 1990, 67, 528.
6. b) E. J. Meijer, C. Detcheverry, P. J. Baesjou, E. van Veenendaal, D. M. De Leeuw, T. M. Klapwijk, J. Appl. Phys. 2003, 93, 4831.
7. c) M. L. Chabinyc, R. A. Street, J. E. Northrup, Appl. Phys. Lett. 2007, 90, 123508.
8. S. Hoshino, M. Yoshida, S. Uemura, T. Kodzasa, N. Takada, T. Kamata, K. Yase, J. Appl. Phys. 2004, 95, 5088.
9. A. R. Brown, C. P. Jarrett, D. M. de Leeuw, M. Matters, Synth. Met. 1997, 88, 37.
10. D. M. Taylor, H. L. Gomes, A. E. Underbill, S. Edge, P. I. Clemenson, J. Phys. D: Appl. Phys. 1991, 24, 2032.
11. M. S. A. Abdou, F. P. Orfino, Y. Son, S. Holdcroft, J. Am. Chem. Soc. 1997, 119, 4518.
12. D. M. De Leeuw, M. M. J. Simenon, A. R. Brown, R. E. F. Einerhand, Synth. Met. 1997, 87, 53.
13. a) A. J. Heeger, S. Kivelson, J. R. Schrieffer, W. P. Su, Rev. Mod. Phys. 1988, 60, 781.
14. b) X. M. Jiang, R. Österbacka, O. Korovyanko, C. P. An, B. Horovitz, R. A. J. Janssen, Z. V. Vardeny, Adv. Funct. Mater. 2002, 12, 587.
15. a) H. Sirringhaus, P. J. Brown, R. H. Friend, M. M. Nielsen, K. Bechgaard, B. M. W. Langeveld-Voss, A. J. H. Spiering, R. A. J. Janssen, E. W. Meijer, P. Herwig, D. M. de Leeuw, Nature 1999, 401, 685.
16. b) R. J. Kline, M. D. McGehee, E. N. Kadnikova, J. Liu, J. M. J. Fréchet, Adv. Mater. 2003, 15, 1519.
17. I. McCulloch, M. Heeney, C. Bailey, K. Genevicius, I. MacDonald, M. Shkunov, D. Sparrowe, S. Tierney, R. Wagner, W. Zhang, M. L. Chabinyc, R. J. Kline, M. D. McGehee, M. F. Toney, Nat. Mater. 2006, 5, 328.
18. M. L. Chabinyc, M. F. Toney, R. J. Kline, I. McCulloch, M. Heeney, J. Am. Chem. Soc. 2007, 129, 3226.
19. Measured by ultraviolet photoemission spectroscopy with photoemission onset determined by linear extrapolation in the same way.
20. a) T. Umeda, S. Tokito, D. Kumaki, J. Appl. Phys. 2007, 101, 054517.
21. b) S. Wang, J. C. Tang, L. H. Zhao, R. Q. Png, L. Y. Wong, P. J. Chia, H. S. O. Chan, P. K. H. Ho, L. L. Chua, Appl. Phys. Lett. 2008, 93, 162103.
22. J. Eastoe, M. J. Hollambly, L. Hudson, Adv. Colloid Interface Sci. 2006, 128, 5.
23. D. W. van Krevelen, Properties of Polymers. Their Correlation with Chemical Structure: Their Numerical Estimation and Prediction from Additive Group Contributions, Elsevier, New York, NY 1990.
24. ab was obtained by integrating this S(λ) over the absorption spectrum of the film. This is the relevant parameter to quantify the potential for photo-reaction because all low-lying electronically excited states relax back to the ground excited state from which photochemical processes occur.
25. R. M. Bentwood, A. J. Barnes, W. J. Orville-Thomas J. Mol. Speetrosc. 1980, 84, 391.
26. a) G. P. Ayers, A. D. E. Pullin, Spectrochim. Acta 1976, 32A, 1629.
27. b) F. Huisken, M. Kaloudis, A. Kulcke, J. Chem. Phys. 1996, 104, 17.
28. C. W. Robertson, D. Williams, J. Opt. Soc. Am. 1971, 67, 1316.
29. a) B. Horovitz, Solid State Commun. 1982, 47, 729.
30. b) J. T. Lopez Navarrete, G. Zerbi, J. Chem. Phys. 1991, 94, 965.
31. K. Kaneto, S. Hayashi, S. Ura, K. Yoshino, J. Phys. Soc. Jpn. 1985, 54, 1146.
32. J. A. E. H. van Haare, E. E. Havinga, J. L. J. van Dongen, R. A. J. Janssen, J. Cornil, J. L Brédas, Chem. Eur. J. 1998, 4, 1509.
33. a) W. H. Robertson, E. G. Diken, E. A. Price, J. W. Shin, M. A. Johnson, Science 2003, 299, 1367.
34. b) H. M. Lee, P. Tarkeshwar, K. S. Kim J. Chem. Phys. 2004, 121, 4657.
35. NIST chemistry webbook, NIST standard reference database number 69 (http://webbook.nist.gov) (Eds: P. J. Linstrom, W. G. Mallard), National Institute of Standards and Technology, Gaithersburg, MD (last accessed January 2009).
36. M. Pope, C. E. Swenberg, Electronic Processes in Organic Crystals and Polymers, Oxford University Press, Oxford, UK 1999.
37. P. J. Chia, S. Sivaramakrishnan, M. Zhou, R. Q. Png, L. L. Chua, R. H. Friend, P. K. H. Ho, Phys. Rev. Lett. 2009, 102, 096602-1-4.
38. a) T. A. Chen, X. Wu, R. D. Rieke, J. Am. Chem. Soc. 1995, 117, 233.
39. b) K. E. Aasmundtveit, E. J. Samuelsen, M. Guldstein, C. Steinsland, O. Flornes, C. Fagermo, T. M. Seeberg, L. A. A. Pettersson, O. Inganäs, R. Feidenhans'l, S. Ferrer, Macromolecules 2000, 33, 3120.
40. c) S. Hugger, R. Thomann, T. Heinzel, T. Thurn-Albrecht, Colloid Polym. Sci. 2004, 2004, 932.
41. W. Ruland, Acta Crptallogr. 1961, 14, 1180.
42. L. L. Chua, J. Zaumseil, J.-F. Chang, E. C. W. Ou, P. K. H. Ho, H. Sirringhaus, R. H. Friend, Nature 2005, 434, 194.
43. P. J. Chia, L. L. Chua, S. Sivaramakrishnan, J. M. Zhuo, L. H. Zhao, W. S. Sim, Y. C. Yeo, P. K. H. Ho, Adv. Mater. 2007, 19, 4202.