Characteristics of cubic MgZnO thin films grown by radio frequency reaction magnetron co-sputtering

Journal of Alloys and Compounds

Volumn 485, Issue 1-2, 2009, Pages 794-797

  Han, S ^a,b   Shen, D Z ^a   Zhang, J Y ^a   Zhao, Y M ^a   Jiang, D Y ^a   Ju, Z G ^a   Zhao, D X ^a   Yao, B ^a  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

MgZnO thin film; rf reaction magnetron co sputtering

Indexed keywords

BAND GAPS; COMPOSITION MODULATIONS; CRYSTAL QUALITIES; CRYSTALLINE QUARTZ; EMPIRICAL FORMULAS; FUSED QUARTZ; GROWTH CHARACTERISTIC; GROWTH PROCESS; GROWTH PROPERTIES; MAGNETRON CO-SPUTTERING; MAGNETRON CO-SPUTTERING TECHNIQUE; METAL TARGET; MGZNO THIN FILM; RADIO FREQUENCIES; RF-POWER;

ABSORPTION SPECTROSCOPY; ENERGY GAP; MAGNETRONS; OXIDE MINERALS; QUARTZ; RADIO; RADIO WAVES; THIN FILM DEVICES; ZINC;

THIN FILMS;

EID: 72149098137     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.06.088     Document Type: Article

References (24)

1. Zhang D.H., and Brodie D.E. Thin Solid Films 238 (1994) 95
2. Takahashi Y., Kanamori M., Kondoh A., Minoura H., and Ohya Y. Jpn. J. Appl. Phys. Part 1 33 (1994) 6611
3. Studenikin S.A., Golego N., and Cocivera M. J. Appl. Phys. 87 (2000) 2413
4. Sharma P., Mansingh A., and Sreenivas K. Appl. Phys. Lett. 80 (2002) 553
5. Choopun S., Vispute R.D.a.W., Yang R.P., Sharma T., and Venkatesan. Appl. Phys. Lett. 80 (2002) 94
6. Chen N.B., Wu H.Z., Qiu D.J., Xu T.N., Chen J., and Shen W.Z. J. Phys. Condens. Mat. 16 (2004) 2973
7. Vashaei Z., Minegishi T., Suzuki H., Hanada T., Cho M.W., Yao T., and Setiawan A. J. Appl. Phys. 98 (2005) 054911
8. Sharma A.K., Narayan J., Muth J.F., Teng C.W., Jin C., Kvit A., Kolbas R.M., and Holland O.W. Appl. Phys. Lett. 75 (1999) 21
9. Narayan J., Sharma A.K., Kvit A., Jin C., MO J.F., and Holland W. Solid State Commun. 121 (2002) 9
10. Zhang B.P., Binh N.T., Wakatsuki K., Liu C.Y., Segawa Y., and Usami N. Appl. Phys. Lett. 86 (2005) 032105
11. Dong X., Zhang B.L., Li X.P., Zhao W., Xia X.C., Zhu H.C., and Du G.T. J. Phys. D: Appl. Phys. 40 (2007) 7298
12. Sanjeev Kumar1, VinayGupte, and Sreenivas K. J. Phys. Condens. Mat. 18 (2006) 3343
13. Minemotoa T., Negamib T., Nishiwaki S., Takakura H., and Hamakawa Y. Thin Solid Films 372 (2000) 173-176
14. Choi C.-H., and Kim S.-H. J. Cryst. Growth 283 (2005) 170
15. Kang S.W., Kim Y.Y., Ahn C.H., Mohanta S.K., and Cho H.K. J. Mater. Sci.: Mater. Electron. 19 (2008) 755-759
16. Cong C.X., Yao B., Zhou Q.J., and Chen J.R. J. Phys. D: Appl. Phys. 41 (2008) 105303
17. Jung E.Y., Lee S.G., Sohna S.H., Lee D.K., and Kim H.K. Appl. Phys. Lett. 86 (2005) 153503
18. Chen J., and Shena W.Z. Appl. Phys. Lett. 83 (2003) 11
19. Koikea K., Hamaa K., Nakashima I., Takada G.-y., Ogata K.-i., Sasaa S., Inouea M., and Yano M. J. Cryst. Growth 278 (2005) 288-292
20. Zhou H.P., and Shen W.Z. Appl. Phys. Lett. 85 (2004) 17
21. Narayan J., Sharma A.K., Kvit A., jin C., Moth J.F., and Holland O.W. Solid State Commun. 121 (2002) 9
22. Cimpoia su A., van der Pers N.M., de Keyser Th.H., Venema A., and Vellekoop M.J. Smart Mater. Struct. 744-750 (1996) 5
23. Chen J., Shen W.Z., Chen N.B., JQiu D., and ZWu H. J. Phys. B: Condens. Mat. 15 (2003) L475
24. Takeuchi I., Yang W., Chang K.S., Aronova M.A., Venkatesan T., Vispute R.D., and Bendersky L.A. J. Appl. Phys. 94 (2003) 7336