Basic characteristics for PEN film surface modification using atmospheric-pressure non-equilibrium microwave plasma jet

IEEJ Transactions on Fundamentals and Materials

Volumn 128, Issue 6, 2008, Pages

  Yuji, Toshifumi ^a   Urayama, Takuya ^b   Fujii, Shuitsu ^b   Iijima, Yoshitoki ^c   Suzaki, Yoshifumi ^d   Akatsuka, Hiroshi ^a,e  

^a UNIVERSITY OF MIYAZAKI   (Japan)

^b ADTEC Plasma Technology Co Ltd   (Japan)

^c JEOL LTD   (Japan)

^d KAGAWA UNIVERSITY   (Japan)

^e TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Contact angle; Microwave plasma jet; Polyethylene naphthalate film; Rotational temperature; Surface modification

Indexed keywords

ATMOSPHERIC PRESSURE; ATMOSPHERIC TEMPERATURE; CONTACT ANGLE; FREE ENERGY; HYDROPHILICITY; MICROWAVES; OPTICAL EMISSION SPECTROSCOPY; PLASMA JETS; PLASMA THEORY; POLYETHYLENES; SURFACE TREATMENT;

BASIC CHARACTERISTICS; HYDROPHILIC PROPERTIES; MICROWAVE DISCHARGE PLASMA JET; MICROWAVE PLASMA JET; POLYETHYLENE NAPHTHALATE; ROTATIONAL TEMPERATURE; SURFACE FREE ENERGY; WATER CONTACT ANGLE;

ELECTRIC DISCHARGES;

EID: 72149083854     PISSN: 03854205     EISSN: 13475533     Source Type: Journal    
DOI: 10.1541/ieejfms.128.449     Document Type: Article

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