Radiative heat transfer at nanoscale mediated by surface plasmons for highly doped silicon

Applied Physics Letters

Volumn 95, Issue 23, 2009, Pages

  Rousseau, Emmanuel ^a   Laroche, Marine ^a   Greffet, Jean Jacques ^a  

^a UNIV PARIS SUD   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CLOSED-FORM EXPRESSION; DOPED SILICON; DOPING LEVELS; NANO SCALE; NEAR-FIELD; RADIATIVE HEAT TRANSFER; SURFACE PLASMONS;

HEAT EXCHANGERS; HEAT RADIATION; NANOSTRUCTURED MATERIALS; PLASMONS; RADIATIVE TRANSFER;

DOPING (ADDITIVES);

EID: 71949107286     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3271681     Document Type: Article

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