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Volumn 11, Issue 4, 1993, Pages 1528-1533

Reactive Magnetron Sputter Deposition of Niobium Nitride Films

Author keywords

[No Author keywords available]

Indexed keywords


EID: 71849095596     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.578696     Document Type: Conference Paper
Times cited : (57)

References (18)
  • 14
    • 0006413482 scopus 로고
    • U.S. Patent No. 4
    • W. D. Sproul and J. A. Tomashek, U.S. Patent No. 4, 428, 811, (1984).
    • (1984) , vol.428 , pp. 811
    • Sproul, W.D.1    Tomashek, J.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.