Chemical vapor crystallization of hard nanocomposite tungsten carbide layers for extreme applications

Advanced Materials Research

Volumn 59, Issue , 2009, Pages 62-65

  Goncharov, V L ^a   Lakhotkin, Yu V ^a   Kuzmin, V P ^a   Alimov, V Kh ^a   Roth, J ^b  

^a FRUMKIN INSTITUTE OF PHYSICAL CHEMISTRY AND ELECTROCHEMISTRY   (Russian Federation)

^b MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

Chemical vapor deposition (CVD); Hydrogen; Tungsten carbide

Indexed keywords

CHEMICAL VAPOR CRYSTALLIZATION; CRYSTALLIZATION PROCESS; CVD COATING; DEPOSITED COATINGS; EXTREME ENVIRONMENT; GASEOUS MIXTURE; MATRIX; MECHANICAL CHARACTERISTICS; METALLIC TUNGSTEN; PHYSICO-CHEMICALS;

COATINGS; CRYSTALLIZATION; ECOLOGY; HYDROGEN; PROPANE; TUNGSTEN; TUNGSTEN CARBIDE; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 71849088982     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/3-908454-01-8.62     Document Type: Conference Paper

References (8)

1. D.A. Tarver: U.S. Patent 3, 574, 672. (1971)
2. N.J. Archer: British Patent 1, 326, 769. (1973)
3. Yu.P. Golovanov, A.I. Krasovsky et al., in: Heat-Resistant and Thermostable Coatings (Nauka, Leningrad 1969) p. 330-336 (in Russian)
4. Yu.V. Lakhotkin and V.P. Kuzmin: U.S. Patent 6, 800, 383, (2004)
5. B.G. Trusov: Modeling of Chemical and Phase Equilibriums at High Temperatures (ASTRA-4/pc) (N.E. Bauman Moscow State Technical University, Moscow 1994) (in Russian)
6. A.I. Krasovsky, K. Chuzhko, V.R. Tregulov, and O.A. Balakhovsky: The Fluoride Process for Tungsten Production. Physico-Chemical Foundations. Properties of the Metal (Nauka, Moscow 1981) (in Russian)
7. Yu.V. Lakhotkin et al.: U.S. Patent 7, 166, 371. (2007)
8. V.L. Goncharov et al., in: Abstracts of the European Corrosion Congress (Budapest, Hungary September-October 2003) p. 309