Erratum: Forming ordered structures in ternary, photosensitive blends through the use of masks (Soft Matter (2009) 5 DOI: 10.1039/b805245j)

Soft Matter

Volumn 5, Issue 24, 2009, Pages 5042-

  Dayal, Pratyush ^a   Kuksenok, Olga ^a   Balazs, Anna C ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 71749117600     PISSN: 1744683X     EISSN: 17446848     Source Type: Journal    
DOI: 10.1039/b924201p     Document Type: Erratum

References (0)