Recovery of indium from etching wastewater using supercritical carbon dioxide extraction

Journal of Hazardous Materials

Volumn 172, Issue 2-3, 2009, Pages 744-748

  Liu, Hui Ming ^a   Wu, Chia Chan ^a   Lin, Yun Hua ^a   Chiang, Chien Kai ^a  

^a HUNGKUANG UNIVERSITY   (Taiwan)

Author keywords

Chelating agents; Etching wastewater; Indium; Indium tin oxide; Supercritical carbon dioxide extraction

Indexed keywords

CHELATING AGENT; CHELATING AGENTS; DIKETONES; DYNAMIC EXTRACTION; ETCHING PROCESS; ETCHING REAGENT; INDIUM TIN OXIDE; INHERENTLY SAFER; RELATIVE STANDARD DEVIATIONS; SINGLE ELEMENT; STANDARD SOLUTIONS; SUPERCRITICAL CARBON DIOXIDE EXTRACTION; SUPERCRITICAL CARBON DIOXIDES; WASTEWATER SAMPLES;

BIOCHEMICAL OXYGEN DEMAND; CARBON DIOXIDE; CHELATION; EFFLUENT TREATMENT; ETCHING; EXTRACTION; INDIUM; KETONES; PHOTOLITHOGRAPHY; SUPERCRITICAL FLUIDS; TIN; TIN DIOXIDE; WASTEWATER;

SUPERCRITICAL FLUID EXTRACTION;

1,3 DIKETONE; CARBON DIOXIDE; CHELATING AGENT; INDIUM TIN OXIDE;

CARBON DIOXIDE; CHELATING AGENT; ETCHING; EXTRACTION METHOD; INDIUM; OXIDATION; PRESSURE EFFECT; REACTION KINETICS; SUPERCRITICAL FLOW; WASTEWATER; WATER TREATMENT;

ACCURACY; ANALYTIC METHOD; ARTICLE; CHELATION; CONTROLLED STUDY; FLUORINATION; PRESSURE MEASUREMENT; PROCESS TECHNOLOGY; SUPERCRITICAL FLUID EXTRACTION; TEMPERATURE MEASUREMENT; WASTE WATER; WATER SAMPLING;

CARBON DIOXIDE; CHROMATOGRAPHY, SUPERCRITICAL FLUID; INDIUM; INDUSTRIAL WASTE; METHODS; WATER POLLUTANTS, CHEMICAL; WATER PURIFICATION;

EID: 71749109169     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2009.07.098     Document Type: Article

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