High-temperature oxidation behaviors of CVD diamond films

Applied Surface Science

Volumn 256, Issue 3, 2009, Pages 668-673

  Pu, Jui Chen ^a   Wang, Sea Fue ^a   Sung, James C ^b  

^a NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^b KINIK Company   (Taiwan)

Author keywords

Diamond films; High temperature oxidation; Raman analysis; Thermal analysis

Indexed keywords

ATMOSPHERIC TEMPERATURE; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; GRAIN BOUNDARIES; SINGLE CRYSTALS; THERMOANALYSIS; THERMOOXIDATION;

CVD DIAMOND FILMS; HIGH TEMPERATURE; HIGH TEMPERATURE OXIDATION BEHAVIOR; HIGH-TEMPERATURE IN SITU; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; RAMAN ANALYSIS; SINGLE CRYSTAL DIAMOND; SINGLE-CRYSTALLINE DIAMOND;

DIAMOND FILMS;

EID: 71749104641     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.08.042     Document Type: Article

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