First-principle study of the AlP/Si interfacial adhesion

Physica B: Condensed Matter

Volumn 405, Issue 2, 2010, Pages 573-578

  Dai, Hongshang ^a   Du, Jing ^b   Wang, Li ^a   Peng, Chuanxiao ^a   Liu, Xiangfa ^a,c  

^a SHANDONG UNIVERSITY   (China)

^b SHANDONG JIANZHU UNIVERSITY   (China)

^c Shandong Binzhou Bohai Piston Co Ltd   (China)

Author keywords

Al Si alloy; First principle; Interfacial adhesion energy; Nucleation

Indexed keywords

ADHESIVE INTERFACES; AL-SI ALLOY; ATOMIC LEVELS; DFT CALCULATION; FIRST-PRINCIPLE STUDY; FIRST-PRINCIPLES; HETEROGENEOUS NUCLEATION; HYPEREUTECTIC AL-SI ALLOYS; INTERFACIAL ADHESION ENERGY; INTERFACIAL ADHESIONS; INTERFACIAL DENSITY; IONIC CHARACTERISTICS; MULLIKEN POPULATIONS; NUCLEATION MECHANISM; PRIMARY SI; PSEUDOPOTENTIALS; STACKING SEQUENCE;

ADHESION; ALUMINUM; BINARY ALLOYS; ELECTRONIC STRUCTURE; INTERFACIAL ENERGY; NUCLEATION; SILICON; SILICON ALLOYS; SULFUR COMPOUNDS;

CRYSTAL ATOMIC STRUCTURE;

EID: 71649105600     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2009.09.068     Document Type: Article

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