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Volumn 1, Issue 1, 2009, Pages 36-39
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A new tool for the post-process modification of chips by nanostructures for chemical sensing
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Author keywords
chemical sensors; electrochemical deposition; etching; nanostructured electrodes
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Indexed keywords
CHEMICAL SENSING;
DEPOSITION FROM SOLUTIONS;
DIFFERENT PROCESS;
ELECTROCHEMICAL DEPOSITION;
FLOW SYSTEMS;
MOVING PLATE;
NANOSTRUCTURED ELECTRODES;
NEW TOOLS;
POST PROCESS;
POST PROCESSING;
POWER SOURCES;
SEMICONDUCTOR TECHNOLOGY;
WAFER PROCESSING;
CHEMICAL MODIFICATION;
CHEMICAL SENSORS;
ELECTROCHEMICAL ELECTRODES;
ELECTRODEPOSITION;
NANOSTRUCTURES;
REDUCTION;
SEMICONDUCTOR DEVICE MANUFACTURE;
SILICON WAFERS;
WET ETCHING;
ELECTROCHEMICAL ETCHING;
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EID: 71649097737
PISSN: 18766196
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1016/j.proche.2009.07.009 Document Type: Conference Paper |
Times cited : (8)
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References (16)
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