Effects of post-deposition surface treatment on the optical, structural and hydrogen sensing properties of TiO2 thin films

Thin Solid Films

Volumn 518, Issue 4, 2009, Pages 1103-1108

  Fasaki, I ^a,b   Hotovy, I ^c   Rehakova, A ^c   Hotovy, J ^c   Rehacek, V ^c   Kompitsas, M ^a   Roubani Kalantzopoulou, F ^b  

^a THEORETICAL AND PHYSICAL CHEMISTRY INSTITUTE   (Greece)

^b NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

^c SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

Author keywords

Hydrogen sensing; Metal modification; TiO2 thin films

Indexed keywords

ANATASE PHASE; ANNEALING TEMPERATURES; DC REACTIVE MAGNETRON SPUTTERING; GLASS SUBSTRATES; HIGH SENSITIVITY; HYDROGEN SENSING; HYDROGEN SENSING PROPERTIES; OPERATING TEMPERATURE; OPTICAL TRANSMITTANCE SPECTRUM; OXIDIZED SILICON SUBSTRATES; POLYCRYSTALLINE; POST DEPOSITION ANNEALING; POST-DEPOSITION; STRUCTURAL AND MORPHOLOGICAL PROPERTIES; SURFACE MODIFICATION; THIN-FILM STRUCTURE; TIO; TIO2 THIN FILMS; XRD PATTERNS;

AMORPHOUS FILMS; ARGON; GLASS; HYDROGEN; OPTICAL PROPERTIES; OXYGEN; PLATINUM; SILICON OXIDES; SUBSTRATES; SURFACE TREATMENT; TITANIUM DIOXIDE;

THIN FILMS;

EID: 71649086867     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.08.052     Document Type: Article

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