Diffusion process applied in fabrication of ion-exchanged optical waveguides in novel Er 3+ and Er 3+/Yb 3+-doped silicate glasses

Journal of Materials Science: Materials in Electronics

Volumn 20, Issue SUPPL. 1, 2009, Pages

  Svecova, B ^a   Spirkova, J ^a   Janakova, S ^a   Mika, M ^a   Oswald, J ^b   Mackova, A ^c  

^a INSTITUTE OF CHEMICAL TECHNOLOGY   (Czech Republic)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE IONS; CHEMICAL COMPOSITIONS; DARK MODE SPECTROSCOPY; DIFFUSION COEFFICIENTS; DIFFUSION PROCESS; ERBIUM DOPED GLASS; EXPERIMENTAL PROCEDURE; FABRICATION PROCESS; OPTICAL AMPLIFIER; PHOTOLUMINESCENCE PROPERTIES; PLANAR OPTICAL WAVEGUIDES; SEM-EDAX; SILICATE GLASS; SPECTROSCOPIC PROPERTY; SURFACE CONCENTRATION; WAVE-GUIDING; WAVEGUIDE LASERS; WAVEGUIDING PROPERTIES;

DIFFUSION; ERBIUM; FABRICATION; GLASS; INTEGRATED OPTOELECTRONICS; ION EXCHANGE; IONS; LIGHT AMPLIFIERS; OPTICAL WAVEGUIDES; OPTOELECTRONIC DEVICES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICATES; YTTERBIUM;

WAVEGUIDES;

EID: 71149101802     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-008-9702-5     Document Type: Conference Paper

References (6)

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