Coating dielectric substrates by plasma-reduction of metallic ions in solvents

Surface and Coatings Technology

Volumn 204, Issue 9-10, 2010, Pages 1347-1352

  Genish, Isaschar ^a   Irzh, Alexander ^a   Gedanken, Aharon ^a   Anderson, Assaf ^a   Zaban, Arie ^a   Klein, Lior ^a  

^a BAR ILAN UNIVERSITY   (Israel)

Author keywords

Coating; Nano particles; Plasma reduction

Indexed keywords

CONDUCTIVE LAYER; CONTROLLED PARAMETER; DEPOSITED FILMS; DIELECTRIC SUBSTRATES; DIELECTRIC SURFACE; ELECTRICAL CONDUCTIVITY; FUTURE APPLICATIONS; GLASS SURFACES; GOLD LAYER; HIGH RESOLUTION; METALLIC IONS; METALLIC PARTICLES; METALLIC THIN FILMS; NANO-SIZE; PLASMA GENERATOR; PLASMA REDUCTION; POROUS SURFACE; RESISTANCE MEASUREMENT; RESISTIVITY MEASUREMENT; SIGNAL SPREADING; TEMPERATURE RANGE; ULTRASONIC BATH; VACUUM CHAMBERS; VAN DER PAUW;

ADHESION; CHEMICAL VAPOR DEPOSITION; COATINGS; ELECTRIC CONDUCTIVITY; ELECTRON BEAMS; HIGH RESOLUTION ELECTRON MICROSCOPY; INERT GASES; METALLIC GLASS; NANOPARTICLES; PLASMA STABILITY; PLASMAS; X RAY DIFFRACTION ANALYSIS;

REDUCTION;

EID: 71049158359     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.09.029     Document Type: Article

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