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Volumn 6, Issue 10, 2009, Pages 2179-2183
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The stress and microstructure of a-C multilayers deposited using a filtered cathodic vacuum arc and periodic substrate bias
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Author keywords
[No Author keywords available]
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Indexed keywords
A-C FILM;
AMORPHOUS CARBON (A-C);
BIAXIAL STRESS;
CARBON IONS;
DEPOSITION PROCESS;
FILTERED CATHODIC VACUUM ARC;
GRAPHITIC PLANES;
INCIDENT ENERGY;
ION ENERGIES;
LOW DENSITY;
PREFERRED ORIENTATIONS;
ROOM TEMPERATURE;
SUBSTRATE BIAS;
SUBSTRATE BIAS VOLTAGES;
TIME DEPENDENT;
VACUUM ARC DEPOSITION SYSTEM;
AMORPHOUS CARBON;
CAVITY RESONATORS;
ELECTRON ENERGY LOSS SPECTROSCOPY;
ENERGY DISSIPATION;
MICROSTRUCTURE;
MULTILAYER FILMS;
MULTILAYERS;
NANOTECHNOLOGY;
SURFACE RELAXATION;
TRANSMISSION ELECTRON MICROSCOPY;
VACUUM;
VACUUM DEPOSITION;
SUBSTRATES;
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EID: 70949091613
PISSN: 18626351
EISSN: None
Source Type: Journal
DOI: 10.1002/pssc.200881704 Document Type: Conference Paper |
Times cited : (3)
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References (20)
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