Summertime photochemical ozone formation in Santiago, Chile

Atmospheric Environment

Volumn 43, Issue 40, 2009, Pages 6398-6407

  Elshorbany, Y F ^a,b   Kleffmann, J ^a   Kurtenbach, R ^a   Rubio, M ^c   Lissi, E ^c   Villena, G ^a,c   Gramsch, E ^c   Rickard, A R ^d   Pilling, M J ^d   Wiesen, P ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

^b NATIONAL RESEARCH CENTRE   (Egypt)

^c UNIVERSIDAD DE SANTIAGO DE CHILE   (Chile)

^d UNIVERSITY OF LEEDS   (United Kingdom)

Author keywords

Master chemical mechanism; Ozone sensitivity; Santiago de Chile; Tropospheric ozone; Urban photochemistry

Indexed keywords

MASTER CHEMICAL MECHANISM; OZONE SENSITIVITY; SANTIAGO DE CHILE; TROPOSPHERIC OZONE; URBAN PHOTOCHEMISTRY;

OZONE; PHOTOCHEMICAL FORMING; PHOTOCHEMICAL REACTIONS; SENSITIVITY ANALYSIS; SIMULATORS; STRATEGIC PLANNING; TROPOSPHERE; VOLATILE ORGANIC COMPOUNDS;

AIR POLLUTION;

CARBON MONOXIDE; FORMALDEHYDE; HYDROGEN PEROXIDE; NITRIC ACID; NITRIC OXIDE; OZONE; VOLATILE ORGANIC COMPOUND;

ATMOSPHERIC CHEMISTRY; COMPUTER SIMULATION; CONCENTRATION (COMPOSITION); FORMATION MECHANISM; NUMERICAL MODEL; OZONE; PHOTOCHEMISTRY; REACTION KINETICS; SENSITIVITY ANALYSIS; SUMMER; TROPOSPHERE; VOLATILE ORGANIC COMPOUND;

AIR POLLUTION; AIR POLLUTION CONTROL; ARTICLE; CHEMICAL ANALYSIS; CHILE; CONTROLLED STUDY; METEOROLOGY; PHOTOCHEMISTRY; PHYSICAL CHEMISTRY; PRIORITY JOURNAL; PUBLIC HEALTH; SENSITIVITY ANALYSIS; SUMMER;

CHILE; METROPOLITANA; SOUTH AMERICA;

EID: 70849116846     PISSN: 13522310     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.atmosenv.2009.08.047     Document Type: Article

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