Variance component analysis based fault diagnosis of multi-layer overlay lithography processes

IIE Transactions (Institute of Industrial Engineers)

Volumn 41, Issue 9, 2009, Pages 764-775

  Yu, Jie ^a   Qin, S Joe ^b  

^a The University of Texas at Austin   (United States)

^b University of Southern California ^*  (United States)

Author keywords

Error propagation; Misalignment error; Multistage fault diagnosis; Overlay lithography process; Semiconductor manufacturing; Variance component analysis

Indexed keywords

ERROR PROPAGATION; FAULT DIAGNOSIS; LITHOGRAPHY PROCESS; MISALIGNMENT ERRORS; SEMICONDUCTOR MANUFACTURING; VARIANCE COMPONENT ANALYSIS;

ALIGNMENT; FAILURE ANALYSIS; FAULT DETECTION; RANDOM ERRORS; STATISTICAL TESTS;

LITHOGRAPHY;

EID: 70749091622     PISSN: 0740817X     EISSN: 15458830     Source Type: Journal    
DOI: 10.1080/07408170902789076     Document Type: Article

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