Physical and microstructural properties of NiO- and Ni-YSZ composite thin films fabricated by pulsed-laser deposition at T≤700°C

Journal of the American Ceramic Society

Volumn 92, Issue 12, 2009, Pages 3059-3064

  Noh, Ho Sung ^a,b   Park, Jong Sung ^a   Son, Ji Won ^a   Lee, Heon ^b   Lee, Jong Ho ^a   Lee, Hae Weon ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANODE ELECTRODES; COMPOSITE THIN FILMS; CRYSTALLINITIES; ELECTRICAL CONDUCTION; ELECTRICAL CONDUCTIVITY; MICROSTRUCTURAL PROPERTIES; NANO-POROUS; NI CONTENT; POROUS STRUCTURES; REDUCTION TEMPERATURES; ROOM TEMPERATURE; YSZ FILMS; YSZ THIN FILMS;

AGGLOMERATION; COMPOSITE FILMS; ELECTRIC CONDUCTIVITY; NICKEL; PULSED LASER DEPOSITION; THIN FILMS;

DEPOSITION;

EID: 70450277175     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2009.03362.x     Document Type: Article

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