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Volumn , Issue , 2005, Pages

Analysis of ESD protection components in 65nm CMOS technology: Scaling perspective and impact on ESD design window

Author keywords

[No Author keywords available]

Indexed keywords

65NM CMOS TECHNOLOGY; CMOS TECHNOLOGY; ESD PROTECTION; LOW POWER APPLICATION; LOW-VOLTAGE TRANSISTORS; SCALING ANALYSIS; TECHNOLOGY SCALING;

EID: 70449715382     PISSN: 07395159     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (25)

References (19)
  • 1
    • 21644478947 scopus 로고    scopus 로고
    • ESD and Latch-up Reliability for Nanometer CMOS Technologies
    • Technical Digest, International, pp
    • C. Duvvury and G. Boselli, "ESD and Latch-up Reliability for Nanometer CMOS Technologies" Electron Devices Meeting, 2004, Technical Digest, International, pp. 933-936.
    • (2004) Electron Devices Meeting , pp. 933-936
    • Duvvury, C.1    Boselli, G.2
  • 5
    • 0842309769 scopus 로고    scopus 로고
    • Technology Scaling Effects on the ESD Design Parameters in Sub-100nm CMOS Transistors
    • Technical Digest, International, pp
    • G. Boselli, J. Rodriguez, C. Duvvury, V. Reddy and B. Hornung, "Technology Scaling Effects on the ESD Design Parameters in Sub-100nm CMOS Transistors", Electron Devices Meeting, 2003, Technical Digest, International, pp. 507-510.
    • (2003) Electron Devices Meeting , pp. 507-510
    • Boselli, G.1    Rodriguez, J.2    Duvvury, C.3    Reddy, V.4    Hornung, B.5
  • 9
    • 0034546887 scopus 로고    scopus 로고
    • nd EOS/ESD Symposium, 2000, pp. 308-317.
    • nd EOS/ESD Symposium, 2000, pp. 308-317.
  • 11
    • 0029477105 scopus 로고    scopus 로고
    • th EOS/ESD Symposium, 1995, pp. 43-61.
    • th EOS/ESD Symposium, 1995, pp. 43-61.
  • 13
    • 0034543814 scopus 로고    scopus 로고
    • nd EOS/ESD Symposium, 2000, pp. 251-259.
    • nd EOS/ESD Symposium, 2000, pp. 251-259.
  • 14
    • 24144498263 scopus 로고    scopus 로고
    • rd International Reliability Physics Symposium, 2005, pp. 98-105.
    • rd International Reliability Physics Symposium, 2005, pp. 98-105.
  • 17
    • 0036508455 scopus 로고    scopus 로고
    • Reliability limits for the gate insulator in CMOS technology
    • March/May
    • J. H. Statis, "Reliability limits for the gate insulator in CMOS technology", in IBM Journal Research & Device, Vol. 46, No. 2/3, March/May 2002, pp. 265-286.
    • (2002) IBM Journal Research & Device , vol.46 , Issue.2-3 , pp. 265-286
    • Statis, J.H.1
  • 19
    • 70449727786 scopus 로고    scopus 로고
    • A Low Leakage Low Cost-PMOS Based Power Supply Clamp with Active Feedback for ESD Protection in 65nm CMOS Technologies
    • J. C. Smith, R. Cline and G. Boselli, "A Low Leakage Low Cost-PMOS Based Power Supply Clamp with Active Feedback for ESD Protection in 65nm CMOS Technologies", to be presented at EOS/ESD Symposium, 2005.
    • (2005) to be presented at EOS/ESD Symposium
    • Smith, J.C.1    Cline, R.2    Boselli, G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.