Low energy electron microscopy for semiconductor applications

Materials Research Society Symposium Proceedings

Volumn 1088, Issue , 2008, Pages 1-12

  Mankos, Marian ^a   Spasov, Vassil ^a   Han, Liqun ^a   Kojima, Shinichi ^a   Jiang, Ximan ^a   Harb, Salam ^a   Grella, Luca ^a   Czarnik, Cory ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; ELECTRONS; SUBSTRATES;

CHARGING EFFECT; DUAL BEAM; FIELD OF VIEWS; LOW ENERGY ELECTRON MICROSCOPES; LOW ENERGY ELECTRON MICROSCOPY; SEMICONDUCTOR APPLICATIONS; SEMICONDUCTOR SUBSTRATE; TWO BEAMS;

SEMICONDUCTOR DEVICES;

EID: 70449675046     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-1088-w03-01     Document Type: Conference Paper

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