Electrodeposited Cu-In-Ga-Se precursor layers

ECS Transactions

Volumn 16, Issue 36, 2009, Pages 39-43

  Bhattacharya, R N ^a   Zhao, W ^a   Phok, S ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALED FILMS; COATED GLASS SUBSTRATES; DEPOSITION BATH; DEPOSITION CURRENT; ELECTRODEPOSITION TECHNIQUE; ELECTROLYTE CONCENTRATION; FLOWING ARGONS; INDUCTIVELY COUPLED PLASMA SPECTROMETRY; PRECURSOR FILMS; PRECURSOR LAYER;

ARGON; CORROSION; ELECTRODEPOSITION; FILM PREPARATION; GALLIUM; GALLIUM ALLOYS; INDUCTIVELY COUPLED PLASMA; MOLYBDENUM; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SELENIUM COMPOUNDS; SEMICONDUCTING SELENIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

COPPER;

EID: 70449671764     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3114007     Document Type: Conference Paper

References (3)

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