Measurement of thickness of native silicon dioxide with a scanning electron microscope

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7405, Issue , 2009, Pages

  Gavrilenko, V P ^a   Novikov, Yu A ^b   Rakov, A V ^b   Todua, P A ^a  

^a Center for Surface and Vacuum Research   (Russian Federation)

^b PROKHOROV GENERAL PHYSICS INSTITUTE   (Russian Federation)

Author keywords

Native silicon dioxide; Scanning electron microscopy; Silicon; Silicon dioxide

Indexed keywords

SCANNING ELECTRON MICROSCOPE; SILICON DIOXIDE; SILICON DIOXIDE FILM;

ELECTRON MICROSCOPES; ELECTRONS; INSTRUMENTS; MEASUREMENTS; SCANNING; SCANNING ELECTRON MICROSCOPY; THICKNESS MEASUREMENT;

SILICA;

EID: 70449631608     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.826190     Document Type: Conference Paper

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