Effects of cathode pulse at low frequency on the structure and composition of plasma electrolytic oxidation ceramic coatings

Journal of Alloys and Compounds

Volumn 488, Issue 1, 2009, Pages 273-278

  Yao, Zhongping ^a   Xu, Yongjun ^a   Jiang, Zhaohua ^a   Wang, Fuping ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Ceramic coatings; Growth characteristic; Plasma electrolytic oxidation; Ti alloy

Indexed keywords

CATHODE CURRENT DENSITY; ELEMENT DISTRIBUTION; ENERGY DISTRIBUTIONS; GRAIN SIZE; GROWTH CHARACTERISTIC; LOW FREQUENCY; PLASMA ELECTROLYTIC OXIDATION; PULSE WIDTH; RUTILE TIO; TI ALLOY; TI ALLOYS; TI-6AL-4V ALLOY; TIO; WORKING FREQUENCY; X RAY DIFFRACTOMETRY;

ALLOYS; ALUMINUM; CERAMIC COATINGS; CERAMIC MATERIALS; COATING TECHNIQUES; ELECTROLYSIS; GRAIN SIZE AND SHAPE; HARDENING; OXIDATION; OXIDE MINERALS; PLASMAS; PROTECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

TITANIUM ALLOYS;

EID: 70449532135     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.08.104     Document Type: Article

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